Early Failure Detection using Pattern Matching and Root Cause Analysis and Empirical Modeling Techniques

Despite spending millions on preventive maintenance and risk-based inspection techniques, unplanned process disruptions and asset downtime continue to plague every company’s process optimization efforts.

Industry studies have shown that up to 82% of all failures cannot be avoid using these techniques since they are considered “random”, meaning they don’t follow a traditional time-based wear or usage failure pattern.  The result is that these “random” failures are costing the global process industry $20 Billion annually.

What makes solving this unplanned disruptions and downtime problem so challenging is the dynamic nature of production process.  With thousands of variations occurring simultaneously within the process it is nearly impossible to predict exactly what patterns or trends will lead to unplanned events, impacting asset performance.

Combining deep process design expertise with real-time big data and machine learning Aspen APM continually monitors and optimizes asset performance at the equipment, process and plant levels. 
It uses a suite of integrated risk, process and performance analytics solutions to predict when and why future disruptions and downtimes will occur and to prescribe responses to proactively avoid issue from occurring.

Audience:

Process Engineers, Plant Operators and Data Analysts who would like to monitor column operation in real time and
predict column related failures.

Training Details

  • Course Id:

    AAA102

  • Duration:

    1 day(s)

  • CEUs Awarded:

    0.7

  • Level:

    Introductory

Approach

Clear guidance on fundamental topics
• Industry workflows
• Hands-on workshops
• Experienced instructor-guided demonstrations
• Q&A on student-specific problems

Pre-requisites

Familiarity with Aspen Plus® is preferred, but not required.

Agenda

  • Introduction
  • Overview of Aspen Asset Analytics
  • Aspen Root Cause Analytic
  • Aspen Pattern Matching
  • Empirical Modeling
  • Workshop #1: Identify the Root Causes for Deviations in Product Purity in a Separation Unit
  • Workshop #2: Identify Data Trends with Aspen Pattern  Matching
  • Workshop #3: Build a Distillation Model Based on Empirical Data

Register for a Class

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Aspen Technology, Inc. awards Continuing Education Units (CEUs) for training classes conducted by our organization. One CEU is granted for every 10 hours of class participation.